Near-surface density profiling of Fe ion irradiated Si (100) using extremely asymmetric x-ray diffraction by variation of the wavelength
Author:
Affiliation:
1. Solid State Physics, University of Siegen, D-57068 Siegen, Germany
2. Helmholtz-Zentrum Dresden-Rossendorf, 01314 Dresden, Germany
3. Synchrotron Light Source ANKA, Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen, Germany
Funder
Deutsche Forschungsgemeinschaft (DFG)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4899068
Reference12 articles.
1. Making waves: Kinetic processes controlling surface evolution during low energy ion sputtering
2. Heavy ion sputtering induced surface topography development
3. Depth profile investigation of the incorporated iron atoms during Kr+ ion beam sputtering on Si (001)
4. Nanopatterning of Si surfaces by normal incident ion erosion: Influence of iron incorporation on surface morphology evolution
5. Surfactant-driven self-organized surface patterns by ion beam erosion
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4. Concurrent segregation and erosion effects in medium-energy iron beam patterning of silicon surfaces;Journal of Physics: Condensed Matter;2018-06-12
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