Photoresist Exposure Technique for High Resolution Etching of Straight Lines-Reference-Cited by-同舟云学术

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Photoresist Exposure Technique for High Resolution Etching of Straight Lines

Published:1970-10 Issue:10 Volume:41 Page:1514-1515
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Sauter G. F.,Paul M. C.,Oberg P. E.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1684329

Reference2 articles.

1. High-resolution Positive Resists for Electron-beam Exposure

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography;Semiconducting Devices;1976

2. Transverse recording using thin film recording heads;IEEE Transactions on Magnetics;1972-06

3. Domain Studies in Thin Film Recording;Review of Scientific Instruments;1971-12

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