Affiliation:
1. Department of Physics, Shanghai Normal University , Shanghai 200234, China
Abstract
We propose an efficient scheme to produce ultrahigh-brightness tens of MeV electron beams by designing a density-tailored plasma to induce a wakefield in the weakly nonlinear regime with a moderate laser energy of 120 mJ. In this scheme, the second bucket of the wakefield can have a much lower phase velocity at the steep plasma density down-ramp than the first bucket and can be exploited to implement longitudinal electron injection at a lower laser intensity, leading to the generation of bright electron beams with ultralow emittance together with low energy spread. Three-dimensional particle-in-cell simulations are carried out and demonstrate that high-quality electron beams with a peak energy of 50 MeV, ultralow emittance of ∼28 nm rad, energy spread of 1%, charge of 4.4 pC, and short duration less than 5 fs can be obtained within a 1-mm-long tailored plasma density, resulting in an ultrahigh six-dimensional brightness B6D,n of ∼2 × 1017 A/m2/0.1%. By changing the density parameters, tunable bright electron beams with peak energies ranging from 5 to 70 MeV, a small emittance of ≤0.1 mm mrad, and a low energy spread at a few-percent level can be obtained. These bright MeV-class electron beams have a variety of potential applications, for example, as ultrafast electron probes for diffraction and imaging, in laboratory astrophysics, in coherent radiation source generation, and as injectors for GeV particle accelerators.
Funder
National Natural Science Foundation of China
Shanghai Municipal Education Commission
National Key Research and Development Program of China
Cited by
1 articles.
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