Exploratory study and application of the angular wavelet analysis for assessing the spatial distribution of breakdown spots in Pt/HfO2/Pt structures
Author:
Affiliation:
1. Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona, Cerdanyola del Vallès, Spain
2. Tyndall National Institute, University College Cork, Cork, Ireland
Funder
EU ascent
Government of Catalonia | Departament d'Universitats, Recerca i Societat de la Informació
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5000004
Reference14 articles.
1. Ultra-thin oxide reliability for ULSI applications
2. Assessing the spatial correlation and conduction state of breakdown spot patterns in Pt/HfO2/Pt structures using transient infrared thermography
3. Dielectric breakdown mechanisms in gate oxides
4. Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress
5. Failure Analysis of MIM and MIS Structures Using Point-to-Event Distance and Angular Probability Distributions
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