Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposure
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.92244
Reference13 articles.
1. Ion Beam Exposure of Resist Materials
2. High‐resolution, ion‐beam processes for microstructure fabrication
3. Ion‐beam lithography for IC fabrication with submicrometer features
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