Applications of heavy-negative-ion sources for materials science (invited)-Reference-Cited by-同舟云学术

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Applications of heavy-negative-ion sources for materials science (invited)

Published:2000-02 Issue:2 Volume:71 Page:1036-1041
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Ishikawa Junzo

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1150380

Reference24 articles.

1. Measurement of heavy negative ion production probabilities by sputtering

2. Neutral and ionized alkaline metal bombardment type heavy negative-ion source (NIABNIS)

3. High‐intensity plasma‐sputter heavy negative‐ion source (invited)

4. Negative metal ion sources (invited)

5. Radio frequency plasma sputter type heavy negative ion source

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Properties of collisional plasma sheath with ionization source term and two-temperature electrons in an oblique magnetic field;Journal of Physics D: Applied Physics;2024-04-22

2. Multi-ion magnetized sheath properties with non-extensive electron distribution;Acta Physica Sinica;2024

3. Numerical Study of Ion Beam Evolution by Applying Pulsed Magnetic Field to RF Plasma;Plasma and Fusion Research;2023-06-14

4. Silicon negative ion implantation induced vacancy defects in thermally grown SiO2 thin films;Radiation Effects and Defects in Solids;2020-05-05

5. Characterization of 100 keV silicon negative ion implanted SiO2 thin films;AIP Conference Proceedings;2020

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