Selectively enhanced silicide formation by a gold interlayer: Probing the dominant diffusing species and reaction mechanisms during thin‐film reactions-Reference-Cited by-同舟云学术

Selectively enhanced silicide formation by a gold interlayer: Probing the dominant diffusing species and reaction mechanisms during thin‐film reactions

Published:1987-08-24 Issue:8 Volume:51 Page:572-574
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Chang Chin‐An,Song Jerng‐Sik

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.98351

Reference20 articles.

1. Effect of CO on the Low Temperature Diffusion of Cr and Si Through Thin Gold Films

2. Annealing ambient: A useful probe for interface interactions in thin films

3. Ambient Effects on Thin Film Interactions

4. Outdiffusion of Si through gold films: The effects of Si orientation, gold deposition techniques and rates, and annealing ambients

5. Pt2Si and PtSi formation with high‐purity Pt thin films

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