Electron thermalization in rare gases and their mixtures
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.471631
Reference40 articles.
1. Time dependent electron distribution functions and degradation spectra: A comparison of the Spencer—Fano equation and the Boltzmann equation
2. Time‐dependent and temperature‐dependent aspects of electron distribution functions: H, Ar, and Cs atomic gases
3. Electron energy distribution functions and thermalization times in methane and in argon–methane mixtures: An effect of vibrational excitation processes
4. Negative differential conductivity of electrons in HeXe and HeKr mixtures
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Time evolution of electron distributions to bimodal steady states for electrons dilutely dispersed in theinert gases Ar, Kr, and Xe with deep Ramsauer Townsend minima in themomentum transfer cross section;Physica Scripta;2023-04-10
2. Electric-field-dependent bimodal distribution functions for electrons in argon, xenon, and krypton owing to the Ramsauer-Townsend minima in the electron-atom momentum-transfer cross sections;Physical Review A;2022-08-10
3. Modeling the thermalization of electrons in conditions relevant to atmospheric pressure He- O2 nanosecond pulsed discharges;Physics of Plasmas;2021-06
4. Kullback-Leibler entropy in the electron distribution shape relaxation for electron-atom thermalization;Physical Review E;2011-10-19
5. VUV–VIS spectroscopic diagnostics of a pulsed high-pressure discharge in argon;Journal of Physics D: Applied Physics;2009-11-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3