Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4728210
Reference20 articles.
1. A practical simulation scheme for slot-excited microwave plasma reactor equipped with dual shower plate
2. Nitridation of steel using a microwave ECR plasma
3. Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge
4. Numerical solution of initial boundary value problems involving maxwell's equations in isotropic media
5. Adjustment of electron temperature in ECR microwave plasma
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1. Effects of dielectric constant and secondary electron emission coefficient on discharge characteristics and products of Ar/NH3 DBD;Physics of Plasmas;2022-03
2. Impact of NH3 plasma treatment for solution-processed indium oxide thin-film transistors with low thermal budget;Journal of Alloys and Compounds;2020-03
3. Structure, electronic, and growth strategies of the $$ {\text{Fe}}_{m} {\text{NH}}_{n}^{ + } $$ Fe m NH n + (1 ≤ m ≤ 5, 1 ≤ n ≤ 4) cation clusters;Journal of Materials Science;2016-11-28
4. Simulation of an Ar/NH3 low pressure magnetized direct current discharge;Physics of Plasmas;2013-01
5. Modeling of plasma chemistry in an atmospheric pressure Ar/NH3 cylindrical dielectric barrier discharge described using the one-dimensional fluid model;Physics of Plasmas;2013-01
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