Strain distribution in the active region of InAs-based interband cascade laser

Author:

Wu Jian-Chu123ORCID,Liu Ruo-Tao13ORCID,Du An-Tian1,Wang Kun13,Cao Chun-Fang1,Yang Jin1,Huang Hua1,Gong Qian123ORCID

Affiliation:

1. National Key Laboratory of Materials for Integrated Circuits, Chinese Academy of Sciences, Shanghai Institute of Microsystem and Information Technology 1 , Shanghai 200050, China

2. School of Information Science and Technology, ShanghaiTech University 2 , Shanghai 201210, China

3. Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences 3 , Beijing 100049, China

Abstract

Energy-dispersive x-ray spectroscopy and high-angle annular dark-field in a Cs-corrected scanning transmission electron microscope are employed to characterize the atomic-scale strain distribution in the active region of the InAs-based interband cascade laser. For the first time, energy-dispersive x-ray spectroscopy is utilized for the quantitative calculation of the zero-strain region, by which the geometric phase analysis of high-angle annular dark-field imaging has been carried out. The strain distribution of the active region with high accuracy has been obtained. The analysis of the out-of-plane strain shows that the active region in the InAs-based interband cascade laser is strain-compensated, while a certain degree of elemental intermixing still exists in the active region. This detailed strain distribution can provide valuable insights into the optimization of the growth conditions for the active region such as growth temperature, V/III flux ratio, and growth process to minimize the elemental intermixing and obtain a better performance interface while maintaining the strain-compensated state.

Funder

National Key Research and Development Program of China

Publisher

AIP Publishing

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