Measurement of OH (X2Σ) in immediate vicinity of dielectric surface under pulsed dielectric barrier discharge at atmospheric pressure using two geometries of laser-induced fluorescence-Reference-Cited by-同舟云学术

Measurement of OH (X2Σ) in immediate vicinity of dielectric surface under pulsed dielectric barrier discharge at atmospheric pressure using two geometries of laser-induced fluorescence

Published:2014-04-07 Issue:13 Volume:115 Page:133302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Teramoto Yoshiyuki,Kim Hyun-Ha,Ogata Atsushi,Negishi Nobuaki

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4870598

Reference33 articles.

1. Measurement of gas temperature and OH density in the afterglow of pulsed positive corona discharge

2. Measurement of Atomic Nitrogen in N2Pulsed Positive Corona Discharge Using Two-Photon Absorption Laser-Induced Fluorescence

3. Production mechanism of atomic nitrogen in atmospheric pressure pulsed corona discharge measured using two-photon absorption laser-induced fluorescence

4. Behaviour of atomic oxygen in a pulsed dielectric barrier discharge measured by laser-induced fluorescence

5. Laser-induced fluorescence of N2( A\,^3\Sigma_{\rm u}^+ ) metastable in N2pulsed positive corona discharge

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