Publisher's Note: “Hard x-ray photoemission study on strain effect in LaNiO3 thin films” [Appl. Phys Lett. 118, 161601 (2021)]

Author:

Yamagami K.12ORCID,Ikeda K.1,Hariki A.3ORCID,Zhang Y.4ORCID,Yasui A.5,Takagi Y.5,Hotta Y.4,Katase T.6ORCID,Kamiya T.6ORCID,Wadati H.147ORCID

Affiliation:

1. Institute for Solid State Physics, The University of Tokyo, Kashiwa, Chiba 277-8581, Japan

2. Okinawa Institute of Science and Technology Graduate University, Onna-son, Okinawa 904-0495, Japan

3. Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan

4. Graduate School of Material Science, University of Hyogo, Kamigori, Hyogo 678-1297, Japan

5. Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan

6. Laboratory for Materials and Structures, Institute of Innovative Research, Tokyo Institute of Technology, Midori, Yokohama, Kanagawa 226-8503, Japan

7. Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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