Electrical response in atomic layer deposited Al:ZnO with varying stack thickness
Author:
Funder
USARO
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4875536
Reference27 articles.
1. Fundamentals of zinc oxide as a semiconductor
2. A comprehensive review of ZnO materials and devices
3. A comparative analysis of deep level emission in ZnO layers deposited by various methods
4. Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films
5. Zinc oxide nanorod based photonic devices: recent progress in growth, light emitting diodes and lasers
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1. Review Article: Atomic layer deposition of doped ZnO films;Journal of Vacuum Science & Technology A;2019-09
2. Transparent and flexible heaters based on Al:ZnO degenerate semiconductor;Journal of Applied Physics;2017-10-07
3. Enhanced Performance in Al-Doped ZnO Based Transparent Flexible Transparent Thin-Film Transistors Due to Oxygen Vacancy in ZnO Film with Zn–Al–O Interfaces Fabricated by Atomic Layer Deposition;ACS Applied Materials & Interfaces;2017-03-27
4. Multilayered Approach for TiO2 Hollow-Shell-Protected SnO2 Nanorod Arrays for Superior Lithium Storage;Langmuir;2016-12-28
5. Al-doped ZnO contact to CdZnTe for x- and gamma-ray detector applications;Applied Physics Letters;2016-06-13
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