Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N2-Reference-Cited by-同舟云学术

Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N2

Published:2012-07 Issue:1 Volume:112 Page:013305
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Schmidt S.,Czigány Zs.,Greczynski G.,Jensen J.,Hultman L.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4733692

Reference54 articles.

1. Amorphous carbon

2. Diamond-like carbon

3. Hydrogen-free amorphous carbon films: correlation between growth conditions and properties

4. Diamond-like carbon — present status

5. Diamond-like amorphous carbon

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced crystalline growth of Cr2AlC MAX phase coating by hybrid DCMS/HiPIMS;Applied Surface Science;2024-09

2. Influence of Carbon ionization increment by adding Ne on the Bonding, Electrical, and Tribological properties of Carbon Thin Films deposited by HiPIMS;2024-06-19

3. Microstructure and mechanical properties of Ti-Nb alloys: comparing conventional powder metallurgy, mechanical alloying, and high power impulse magnetron sputtering processes for supporting materials screening;Journal of Materials Science;2024-05

4. Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiation;Journal of Applied Physics;2023-10-09

5. Influence of plasma ionization on the elastic modulus and tribology behavior of carbon films deposited by the HiPIMS technique;Ceramics International;2023-01