Epitaxial integration and properties of SrRuO3 on silicon

Author:

Wang Zhe1,Nair Hari P.2,Correa Gabriela C.2ORCID,Jeong Jaewoo3,Lee Kiyoung4,Kim Eun Sun5,H. Ariel Seidner2,Lee Chang Seung4,Lim Han Jin5,Muller David A.16,Schlom Darrell G.26

Affiliation:

1. School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA

2. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA

3. New Memory Technology Lab, Semiconductor R&D Center, Samsung Electronics, Milpitas, California 95053, USA

4. Platform Technology Laboratory, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, 130 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 16678, South Korea

5. Samsung Semiconductor R&D Center 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, South Korea

6. Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA

Funder

DOE CSGF

National Nanotechnology Coordinated Infrastructure

Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials

Alfred P. Sloan Foundation

W. M. Keck Foundation

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

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