In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
Author:
Affiliation:
1. Faculty of Mathematics and Physics, Charles University, Prague, Czech Republic
2. Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
Funder
Grantov\xE1 Agentura, Univerzita Karlova
Ministerstvo Školství, Mládeže a Tělovýchovy
Grantová Agentura České Republiky
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5102163
Reference37 articles.
1. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition
2. Structural and electrical properties of TiO2 thin films
3. Industrial Plasma Engineering
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