Investigating the influence of substrate orientation and temperature on Cu cluster deposition

Abstract

The crystal orientation and the temperature of the substrate are crucial factors that influence clusters deposition and, consequently, the properties of thin films. In this study, the molecular dynamics simulation method was employed to investigate the deposition of Cu55 clusters on Fe(001), Fe(011), and Fe(111) substrates with varying crystal orientations. The incident energies used ranged from 0.1 to 20.0 eV/atom, and the substrates were maintained at temperatures of 300, 500, and 800 K. Analysis of cluster and substrate atom snapshots, along with the physical properties of clusters, revealed how the crystal orientation of Fe substrates affects the morphology and structure of the cluster at different temperatures. Additionally, specific microscopic mechanisms responsible for these effects were identified. The simulation results demonstrate that the crystal orientation of Fe substrate significantly influences the deposition of Cu55 clusters. The structures of the clusters on the three crystal substrates undergo similar changes as the substrate temperature increases, with the Cu55 clusters on the Fe(111) substrate exhibiting the most significant changes in response to the temperature rise.