Hundred joules plasma focus device as a potential pulsed source for in vitro cancer cell irradiation-Reference-Cited by-同舟云学术

Hundred joules plasma focus device as a potential pulsed source for in vitro cancer cell irradiation

Author:

Jain J.¹²,Moreno J.²³⁴,Andaur R.⁵,Armisen R.⁶⁷^ORCID,Morales D.²,Marcelain K.⁵,Avaria G.²³⁴^ORCID,Bora B.²³⁴,Davis S.²³⁴,Pavez C.²³⁴,Soto L.²³⁴

Affiliation:

1. Universidad de Talca, 2 Norte 685, Casilla 721, Talca, Chile

2. Comisión Chilena de Energía Nuclear, Casilla 188-D, Santiago, Chile

3. Center for Research and Applications in Plasma Physics and Pulsed Power, Santiago 7600713, Santiago, Chile

4. Universidad Andres Bello, Departamento de Ciencias Fisicas, Republica 220, Santiago, Chile

5. Departamento de Oncología Básico-clínica, Facultad de Medicina, Universidad de Chile, Independencia 1027, Independencia, Santiago, Chile

6. Centro de Investigación y Tratamiento del Cáncer, Facultad de Medicina, Universidad de Chile, Independencia 1027, Independencia, Santiago, Chile

7. Current affiliation: Center for Excellence in Precision Medicine, Pfizer Chile, Santiago 7810305, Santiago, Chile

Funder

CONICYT-PIA

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

Reference27 articles.

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献