Structural and microstructural characterization of nanocrystalline silicon thin films obtained by radio-frequency magnetron sputtering-Reference-Cited by-同舟云学术

Structural and microstructural characterization of nanocrystalline silicon thin films obtained by radio-frequency magnetron sputtering

Published:2005-02 Issue:3 Volume:97 Page:034307
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Morales M.,Leconte Y.,Rizk R.,Chateigner Daniel

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1841461

Reference63 articles.

1. U. F. Kocks, C. N. Tomé, and H.R. Wenk,Texture and Anisotropy: Preferred Orientations in Polycrystals and Their Effect on Materials Properties(Cambridge University Press, New York, 1988), Vol. 1, Chap. 6, p. 272.

2. Formation of a transient Si hydride multilayer and recrystallization of a Si-Si network during vacuum-ultraviolet-excited Si homoepitaxy fromSi2H6

3. Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

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