Bohm sheath criterion and dust charging for active magnetized plasma in the presence of q-nonextensive electron distribution

Author:

Acharya Num Prasad1ORCID,Basnet Suresh1ORCID,Khanal Raju1ORCID

Affiliation:

1. Central Department of Physics, Tribhuvan University , Kirtipur, Kathmandu 44613, Nepal

Abstract

We have investigated the Bohm sheath criterion and evolution of dust charge at the sheath edge for the collisional active magnetized plasma in the presence of q-nonextensive electron distribution. The set of governing equations has been numerically solved for given initial conditions, whereas the dust charging equation has been solved using the –Raphson method. The Bohm sheath condition for active plasma has been extended using the Sagdeev potential approach, and it has been found that gas pressure, obliqueness of the magnetic field, source and sink terms, and choice of electron distribution affect the Bohm velocity, sheath thickness, floating potential, and evolution of dust charge. As the magnetic field, gas pressure, and nonextensive parameter q increase, the Bohm velocity is found to be decreasing (from supersonic to subsonic), and its explicit effect can be seen on the dust charging process. The magnitude of the E × B drift velocity of ions at the sheath edge determines the Bohm velocity, floating potential, and dust screening length as well. Furthermore, we have presented the comparison of the obtained results for two different cases: (i) unmagnetized and magnetized cases and (ii) active and quiescent plasmas.

Funder

University Grants Commission - Nepal

RCDC, TU, Kirtipur

Publisher

AIP Publishing

Subject

General Physics and Astronomy

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3