SiO2 film thickness metrology by x-ray photoelectron spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.120438
Reference17 articles.
1. Calculations of electron inelastic mean free paths. III. Data for 15 inorganic compounds over the 50-2000 eV range
2. A reassessment of electron escape depths in silicon and thermally grown silicon dioxide thin films
3. Film thickness measurements of SiO2 by XPS
4. Effects of elastic and inelastic electron scattering on quantitative surface analyses by AES and XPS
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