Thickness and temperature dependence of stress relaxation in nanoscale aluminum films-Reference-Cited by-同舟云学术

Thickness and temperature dependence of stress relaxation in nanoscale aluminum films

Published:2003-11-24 Issue:21 Volume:83 Page:4411-4413
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Hyun S.,Brown W. L.,Vinci R. P.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1629381

Reference9 articles.

1. High-temperature tensile tests and activation volume measurement of free-standing submicron Al films

2. Transient creep in free-standing thin polycrystalline aluminum films

3. Stress relaxation in thin aluminium films

4. Stress relaxation of continuous film and narrow line metallizations of aluminum on silicon substrates

5. The effect of laser reflow on the variation of stress with thermal cycling in aluminum thin films

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