Dependence of physical properties and giant magnetoresistance ratio on substrate position during rf sputtering of NiO and α-Fe2O3 for bottom spin valves-Reference-Cited by-同舟云学术

Dependence of physical properties and giant magnetoresistance ratio on substrate position during rf sputtering of NiO and α-Fe2O3 for bottom spin valves

Published:2002-09-16 Issue:12 Volume:81 Page:2208-2210
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Bae Seongtae,Judy Jack H.,Chen P. J.,Egelhoff W. F.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1508161

Reference7 articles.

1. Interlayer coupling and surface roughness in GMR spin valves

2. Investigation of interface orientation and interface mixing in spin valve heterostructures

3. Annealing effect on magnetic characteristics on (La,Sr)MnO/sub 3/ sputtered films

4. Effect of microstructure on resistivity and GMR ratio in ion beam deposited spin valves

5. Effect of energetic particle bombardment during sputter deposition on the properties of exchange‐biased spin‐valve multilayers

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