Model of bias sputtering applied to the control of Nb film properties
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.325518
Reference16 articles.
1. Electrical Characteristics of rf‐Sputtered Single‐Crystal Niobium Films
2. Superconductivity transition temperatures of rf reactively sputtered NbN Films
3. Superconductivity in Nb–Ge films above 22 K
4. Control of Film Properties by rf-Sputtering Techniques
5. Properties of Superconducting Niobium Films Made by Asymmetric ac Sputtering
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1. Non-Uniform Axial Electric Field in Argon Glow Discharge Plasma;Chinese Physics Letters;2006-04-28
2. Structure and preferred orientations in ion-plated niobium films and correlation of the substrate bias voltage with calculated strain energies;Thin Solid Films;1989-01
3. Electronic structure modification induced by ion irradiation during film growth of Cu and Pd;Applied Physics Letters;1988-12-19
4. Sputter deposition of single crystal metal multilayers;Journal of Crystal Growth;1986-12
5. Optical and electrical properties of thin silver films grown under ion bombardment;Physical Review B;1986-01-15
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