Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods
Author:
Affiliation:
1. Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550, USA
2. Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, 257 Fuller Road, Albany, New York 12203, USA
Funder
U.S. Department of Energy
Laboratory Directed Research and Development
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0053219
Reference27 articles.
1. Use of hafnium dioxide in multilayer dielectric reflectors for the near uv
2. Refractive index of some oxide and fluoride coating materials
3. Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
4. 355-nm, nanosecond laser mirror thin film damage competition
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1. Polarization dependence of laser damage growth features on multilayer dielectric mirrors for petawatt-class lasers;Optics Letters;2022-11-23
2. Improving the laser performance of ion beam sputtered dielectric thin films through the suppression of nanoscale defects by employing a xenon sputtering gas;Optical Materials Express;2022-08-03
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