Optimizing the quality factor of InP nanobeam cavities using atomic layer deposition

Author:

Rahaman Mohammad Habibur12ORCID,Lee Chang-Min12ORCID,Buyukkaya Mustafa Atabey12ORCID,Harper Samuel12ORCID,Islam Fariba12ORCID,Addamane Sadhvikas3,Waks Edo1245ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, University of Maryland 1 , College Park, Maryland 20742, USA

2. Institute for Research in Electronics and Applied Physics (IREAP), University of Maryland 2 , College Park, Maryland 20742, USA

3. Center for Integrated Nanotechnologies, Sandia National Laboratories 3 , Albuquerque, New Mexico 87123, USA

4. Department of Physics, University of Maryland 4 , College Park, Maryland 20742, USA

5. Joint Quantum Institute (JQI), University of Maryland 5 , College Park, Maryland 20742, USA

Abstract

Photonic crystal nanobeam cavities are valued for their small mode volume, CMOS compatibility, and high coupling efficiency-crucial features for various low-power photonic applications and quantum information processing. However, despite their potential, nanobeam cavities often suffer from low quality factors due to fabrication imperfections that create surface states and optical absorption. In this work, we demonstrate InP nanobeam cavities with up to 140% higher quality factors by applying a coating of Al2O3 via atomic layer deposition to terminate dangling bonds and reduce surface absorption. Additionally, changing the deposition thickness allows precise tuning of the cavity mode wavelength without compromising the quality factor. This Al2O3 atomic layer deposition approach holds great promise for optimizing nanobeam cavities that are well-suited for integration with a wide range of photonic applications.

Funder

National Science Foundation Graduate Research Fellowship Program

Air Force Office of Scientific Research

Department of Defense Contract

Office of Naval Research

Maryland-ARL Quantum Partnership

Publisher

AIP Publishing

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