Nb/Ni and Ni/Nb bilayers on Si: Rapid thermal processing, phase separation, and ternary phase formation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347642
Reference16 articles.
1. Ti/Ni bilayers on silicon: Sputter-induced intermixing, rapid thermal annealing and ternary silicide formation
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4. Phase separation and layer sequence reversal during silicide formation with Ni‐Cr alloys and Ni‐Cr bilayers
5. Silicide formation with Pd‐V alloys and bilayers
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1. Experimental investigation of phase equilibria in the Nb–Ni–Si refractory alloy system at 1323 K;Journal of Alloys and Compounds;2020-11
2. Experimental investigation of phase equilibria in the Nb–Ni–Si refractory alloy system at 1073 K;Scripta Materialia;2019-04
3. Thermodynamic modelling of the Nb–Ni–Si phase diagram based on the 1073 K isothermal section using ab initio calculations;Calphad;2015-12
4. Reinvestigation of the first nucleated phase in Nb/Si multilayers;Thin Solid Films;1996-11
5. Initial phase formation in Nb/Si multilayers deposited at different temperatures;Journal of Applied Physics;1996-08
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