Stabilizing solution-processed metal oxide thin-film transistors via trilayer organic–inorganic hybrid passivation
Author:
Affiliation:
1. Material Innovation Research Center and Department of Advanced Materials Science, Graduate School of Frontier Sciences, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8561, Japan
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0038128
Reference37 articles.
1. A Review of Low‐Temperature Solution‐Processed Metal Oxide Thin‐Film Transistors for Flexible Electronics
2. Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water
3. Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
4. Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors
5. Electrical Stability of Solution-Processed a-IGZO TFTs Exposed to High-Humidity Ambient for Long Periods
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