Comparative study on laser cleaning SiO2 particle on SrTiO3 and Si surfaces

Author:

Wu Lingyan1,Yang Aini1,Ma Chi1ORCID,He Jun2,Yu Lejun3,Sun Bo2,Ma Tianxing1ORCID,Dou Ruifen1,Nie Jiacai1,Xiong Changmin1ORCID

Affiliation:

1. Department of Physics, Beijing Normal University, Xinjiekouwai Street No. 19, Beijing, China

2. School of Artificial Intelligence, Engineering Research Center of Intelligent Technology and Educational Application, Ministry of Education, College of Education for the Future, Beijing Normal University, Beijing, China

3. School of Artificial Intelligence, Engineering Research Center of Intelligent Technology and Educational Application, Ministry of Education, Beijing Normal University, Beijing, China

Abstract

In this paper, we perform a comparative study, both experimentally and theoretically, on the dry laser cleaning SiO2 particles on the surface of SrTiO3 (STO) and Si single crystal substrates. Firstly, the dependences of the cleaning efficiency on the laser energy density, the pulse number, and the size of SiO2 particles was investigated experimentally. It is found that the laser cleaning threshold decreases with the increase of SiO2 particle size. Furthermore, for the same size of SiO2 particles, the laser cleaning threshold of the STO surface is larger than that of Si. Then, based on the analysis of the interactions among the light field, the particles, and the substrate material, a corrected thermal expansion model with a quantified field enhancement effect was proposed, which provides a good simulation of the dependence of the laser cleaning threshold on the particle size and the substrate. These results further deepen our understanding of the laser dry cleaning, particularly the cleaning process on the oxide surface.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Theoretical and experimental research on nanosecond laser cleaning of SiO2 particles on silicon wafer surface;The International Journal of Advanced Manufacturing Technology;2023-12-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3