Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation-Reference-Cited by-同舟云学术

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Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation

Published:2007-01-22 Issue:4 Volume:90 Page:044107
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Izawa Yusaku,Izawa Yasukazu,Setsuhara Yuichi,Hashida Masaki,Fujita Masayuki,Sasaki Ryuichiro,Nagai Hiroyuki,Yoshida Makoto

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2431709

Reference14 articles.

1. Ablation of metals by ultrashort laser pulses

2. Laser ablation of dielectrics with pulse durations between 20 fs and 3 ps

3. Blue light and infrared continuum generation by soliton fission in a microstructured fiber

4. Polarisation-independence of femtosecond laser machining of fused silica

5. Reflectivity in femtosecond-laser-induced structural changes of diamond-like carbon film

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1. Dynamics of phase transformations in Si and Ge upon strong excitation with UV femtosecond laser pulses;Applied Surface Science;2024-09

2. Amorphization and Ablation of Crystalline Silicon Using Ultrafast Lasers: Dependencies on the Pulse Duration and Irradiation Wavelength;Laser & Photonics Reviews;2024-07-02

3. Modifying single-crystal silicon and trimming silicon microring devices by femtosecond laser irradiation;Optics Express;2024-04-18

4. Controllable Si micro-structuring by temporally modulated single-shot femtosecond pulse lithography;Applied Physics Letters;2024-04-01

5. Array structure of monocrystalline silicon surface processed by femtosecond laser machining assisted with anisotropic chemical etching;Optics & Laser Technology;2024-02

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