Suppression of stress‐induced leakage current in ultrathin N2O oxides
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.106835
Reference10 articles.
1. Dielectric breakdown in electrically stressed thin films of thermal SiO2
2. Time-dependent dielectric breakdown of ultra-thin silicon oxide
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