Silicon–oxygen complexes containing three oxygen atoms as the dominant thermal donor species in heat‐treated oxygen‐containing silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332728
Reference5 articles.
1. Mechanism of the Formation of Donor States in Heat-Treated Silicon
2. Electrical and infrared spectroscopic investigations of oxygen-related donors in silicon
3. Influence of oxygen on silicon resistivity
4. Oxygen diffusion and thermal donor formation in silicon
5. Bestimmung von parts per billion sauerstoff in silizium durch eichung der IR-absorption bei 77°K
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