Recombination coefficients for Cl on plasma-conditioned yttrium oxide chamber wall surfaces
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, USA
Funder
Samsung
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5045483
Reference57 articles.
1. Plasma etching: Yesterday, today, and tomorrow
2. Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas
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