Study of silicon contamination and near‐surface damage caused by CF4/H2reactive ion etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95243
Reference10 articles.
1. Plasma-Assisted Etching in Microfabrication
2. RIE Contamination of Etched Silicon Surfaces
3. Silicon Damage Caused by Hydrogen Containing Plasmas
4. Damage induced in Si by ion milling or reactive ion etching
5. New precision technique for measuring the concentration versus depth of hydrogen in solids
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