Angled etching of GaAs/AlGaAs by conventional Cl2reactive ion etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.100204
Reference7 articles.
1. Nonselective etching of GaAs/AlGaAs double heterostructure laser facets by Cl2reactive ion etching in a load‐locked system
2. Monolithic two‐dimensional surface‐emitting arrays of GaAs/AlGaAs diode lasers
3. Directional reactive‐ion‐etching of InP with Cl2 containing gases
4. Low-threshold InGaAsP/InP 1.3 μm doubly buried-heterostructure lasers with a reactive-ion-etched facet
5. Ion−beam etching
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