Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film-Reference-Cited by-同舟云学术

Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film

Author:

Zhang Haibao¹²³,Cherng Jyh-Shiarn²³,Chen Qiang¹

Affiliation:

1. Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, People’s Republic of China

2. Department of Materials Engineering, Ming Chi University of Technology, Taipei 24301, Taiwan

3. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taipei 24301, Taiwan

Funder

National Natural Science Foundation of China

Organization department of Beijing Municipal Party Committee

Beijing Municipal Commission of Education

Beijing Institute of Graphic Communication

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

Reference85 articles.

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