Impact of annealing on the chemical structure and morphology of the thin-film CdTe/ZnO interface

Author:

Horsley K.1,Beal R. J.2,Wilks R. G.3,Blum M.14,Häming M.15,Hanks D. A.1,Weir M. G.1,Hofmann T.16,Weinhardt L.157,Bär M.138,Potter B. G.29,Heske C.15710

Affiliation:

1. Department of Chemistry, University of Nevada, Las Vegas (UNLV), Las Vegas, Nevada 89154, USA

2. Materials Science and Engineering Department, University of Arizona, Tucson, Arizona 85721, USA

3. Solar Energy Research, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (HZB), 14109 Berlin, Germany

4. Advanced Light Source (ALS), Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

5. Institute for Photon Science and Synchrotron Radiation, Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany

6. Bundeswehr Research Institute for Materials, Fuels and Lubricants (WIWeB), Institutsweg 1, 85435 Erding, Germany

7. ANKA Synchrotron Radiation Facility, Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen, Germany

8. Institut für Physik und Chemie, Brandenburgische Technische Universität Cottbus-Senftenberg, 03046 Cottbus, Germany

9. College of Optical Sciences, University of Arizona, Tucson, Arizona 85721, USA

10. Institute for Chemical Technology and Polymer Chemistry, Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany

Funder

Office of Naval Research (ONR)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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