Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.327379
Reference4 articles.
1. Thin film interaction between titanium and polycrystalline silicon
2. Physical and X-Ray Study of the Disilicides of Titanium, Zirconium, and Hafnium
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