Favorable formation of the C49-TiSi2 phase on Si(001) determined by first-principles calculations
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.121005
Reference15 articles.
1. Titanium Silicides and their Technological Applications
2. Metastable phase formation in titanium‐silicon thin films
3. Morphology and phase stability of TiSi2on Si
4. Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/
5. Nucleation and Morphology of TiSi2 on Si
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3. Ab initio comparative study of C54 and C49 TiSi2 surfaces;Applied Surface Science;2006-05
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5. Metal Silicides in CMOS Technology: Past, Present, and Future Trends;Critical Reviews in Solid State and Materials Sciences;2003-11
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