Model for nitridation of nanoscale SiO2 thin films in pulsed inductively coupled N2 plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1949272
Reference24 articles.
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2. IEEE International Electron Devices Meeting;Song S. C.,1998
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4. Ultra-thin decoupled plasma nitridation (DPN) oxynitride gate dielectric for 80-nm advanced technology
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