AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon-Reference-Cited by-同舟云学术

AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon

Published:2016-06-28 Issue:24 Volume:144 Page:244709
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Li Shaowei,Zheng Yanjun,Chen Changfeng

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4954835

Reference27 articles.

1. Solvent Effects on Molecular Packing and Tribological Properties of Octadecyltrichlorosilane Films on Silicon

2. The effect of chain density on the frictional behavior of surfaces modified with alkylsiloxanes and immersed in n-alcohols

3. Impact of chain length, temperature, and humidity on the growth of long alkyltrichlorosilane self-assembled monolayers

4. Communication: Anti-icing characteristics of superhydrophobic surfaces investigated by quartz crystal microresonators

5. n-Alkylsiloxanes: From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of n-Octadecyltrichlorosilane

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