Molecular‐weight dependence of developed contours in poly‐ (methyl methacrylate) electron resists
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.326276
Reference10 articles.
1. Scattering of Highly Focused Kilovolt Electron Beams by Solids
2. An exposure model for electron-sensitive resists
3. Energy dissipation in a thin polymer film by electron beam scattering
4. Experimental and theoretical study of energy dissipation profiles of keV electrons in polymethylmethacrylate
5. Time evolution of developed contours in poly‐(methyl methacrylate) electron resist
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1. Investigation of fabrication process for sub 20-nm dense pattern of non-chemically amplified electron beam resist based on acrylic polymers;SPIE Proceedings;2016-10-04
2. Developer molecular size dependence of pattern formation of polymer type electron beam resists with various molecular weights;SPIE Proceedings;2016-05-10
3. Exposure characterizations of polymer type electron beam resists with various molecular weights for next-generation photomask;SPIE Proceedings;2015-10-23
4. Nanolithography in polymethylmethacrylate: An atomic force microscope study;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11
5. Parametric modeling at resist–substrate interfaces;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
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