Hydrogen‐radical‐assisted radio‐frequency plasma‐enhanced chemical vapor deposition system for diamond formation
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1146946
Reference20 articles.
1. CH3OH Concentration and Total Pressure Dependence of Diamond Films Formed from CH3OH-H2Mixed Gas by Magnet-Active Microwave Plasma Chemical Vapor Deposition
2. Fabrication of Diamond Films at Low Pressure and Low-Temperature by Magneto-Active Microwave Plasma Chemical Vapor Deposition
3. Mechanism for diamond growth from methyl radicals
4. Vapor growth of diamond on diamond and other surfaces
5. On the role of oxygen and hydrogen in diamond‐forming discharges
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