Reduced resistance drift in tunnel junctions using confined tunnel barriers
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20740, USA
2. National Institute of Standards and Technology, Gaithersburg, Maryland 20899-8423, USA
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4996497
Reference38 articles.
1. Square‐Mean‐Root Approximation for Evaluating Asymmetric Tunneling Characteristics
2. Annealing effects in tunnel junctions (thermal annealing)
3. Plasma oxidation of thin aluminum layers for magnetic spin-tunnel junctions
4. Optical and in situ characterization of plasma oxidized Al for magnetic tunnel junctions
5. Stability of high‐quality Nb/AlOx/Nb Josephson junctions
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1. Reduction of charge offset drift using plasma oxidized aluminum in SETs;Scientific Reports;2020-10-26
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