A novel silicon etching method using vapor of tetramethylammonium hydroxide solution-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

A novel silicon etching method using vapor of tetramethylammonium hydroxide solution

Published:2020-12 Issue:6 Volume:33 Page:769-774
ISSN:1674-0068
Container-title:Chinese Journal of Chemical Physics
language:en
Short-container-title:Chinese Journal of Chemical Physics

Author:

He Jian¹,Zhao Yue-fang¹,Xu Fang-liang¹²,Zhao Dong-yang³,Hou Xiao-juan¹,Chou Xiu-jian¹

Affiliation:

1. Key Laboratory of Instrumentation and Dynamic Measurement of Ministry of Education, North University of China, Taiyuan 030051, China

2. Nanjing Micro-Nano Engineering Research Center, Nanjing 210000, China

3. Beijing Institute of Computer Application, Beijing 100089, China

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry

Link

http://cps.scitation.org/doi/pdf/10.1063/1674-0068/cjcp2007116

Reference34 articles.

1. On hillocks generated during anisotropic etching of Si in TMAH

2. Evolution of hillocks during silicon etching in TMAH

3. Experiments on anisotropic etching of Si in TMAH

4. Investigations on the morphology of silicon surfaces anisotropically etched with TMAH

5. The Improvement of Wet Anisotropic Etching with Megasonic Wave

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP