Effect of oxidation ambient on the dielectric breakdown characteristics of thermal oxide films of silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.355731
Reference6 articles.
1. Dependence of thin-oxide films quality on surface microroughness
2. Dielectric Breakdown in Silicon Dioxide Films on Silicon
3. Silicon Oxidation Studies: Some Aspects of the Initial Oxidation Regime
4. Direct Evidence for 1 nm Pores in “Dry”Thermal SiO2 from High Resolution Transmission Electron Microscopy
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dielectric breakdown of PDMS thin films;Journal of Micromechanics and Microengineering;2013-04-26
2. Atomic Layer Control for Suppressing Extrinsic Defects in Ultrathin SiON Gate Insulator of Advanced Complementary Metal–Oxide–Semiconductor Field-Effect Transistors;Japanese Journal of Applied Physics;2010-04-20
3. Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits;Journal of Applied Physics;2001-09
4. Electrical properties of thin gate dielectric grown by rapid thermal oxidation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-11
5. Simulation of degradation of dielectric breakdown field of thermal SiO/sub 2/ films due to voids in Si wafers;IEEE Transactions on Electron Devices;2000
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3