Author:
Sultan A.,Craig M.,Reddy K.,Banerjee S.,Ishida E.,Maillot P.,Neil T.,Larson L.
Subject
Physics and Astronomy (miscellaneous)
Cited by
9 articles.
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1. Dopant Diffusion;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09
2. Post-annealing sequence effects on the characteristics of 20keV BF2 ion implantation at various ion fluences;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-01
3. Fluorine-enhanced boron diffusion induced by fluorine postimplantation in silicon;Journal of Applied Physics;2004-10
4. Transistors and Atoms;Springer Series in MATERIALS SCIENCE;2004
5. Process modeling for future technologies;IBM Journal of Research and Development;2002-03