Effects of oxygen and pressure on diamond synthesis in a magnetoactive microwave discharge
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351024
Reference18 articles.
1. Temperature and reactive etching effects on the microstructure of microwave plasma deposited diamond films
2. Effect of oxygen in diamond deposition at low substrate temperatures
3. Low‐temperature diamond deposition by microwave plasma‐enhanced chemical vapor deposition
4. The effect of oxygen in diamond deposition by microwave plasma enhanced chemical vapor deposition
5. Low temperature (∼400 °C) growth of polycrystalline diamond films in the microwave plasma of CO/H2 and CO/H2/Ar systems
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