Epitaxial growth of BiFeO3 films on TiN under layers by sputtering deposition-Reference-Cited by-同舟云学术

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Epitaxial growth of BiFeO3 films on TiN under layers by sputtering deposition

Published:2017-01-20 Issue:5 Volume:7 Page:055815
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Wang Yue¹,Li Tianjun¹,Wang Jian²,Harumoto Takashi¹,Jia Tingting²,Kimura Hideo²,Nakada Katsuyuki³,Nakagawa Shigeki⁴,Nakamura Yoshio¹,Shi Ji¹

Affiliation:

1. School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8550, Japan

2. National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

3. Technical Center, TDK Corporation, Japan

4. School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8550, Japan

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference28 articles.

1. Recent Progress in Multiferroic Magnetoelectric Composites: from Bulk to Thin Films

2. BiFeO3epitaxial thin films and devices: past, present and future

3. Electric field control of magnetism using BiFeO3-based heterostructures

4. Synthesis and ferroelectric properties of epitaxial BiFeO3 thin films grown by sputtering

5. Microscopic Origin of the Giant Ferroelectric Polarization in Tetragonal-likeBiFeO3

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Origin of abnormal structural transformation in a (BiPb)FeO3/SrRuO3/SrTiO3 hetero-structure probed by Rutherford backscattering;Scientific Reports;2017-07-03

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