Investigation of the mechanism of titanium silicide reaction using ion-beam-assisted deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.125184
Reference11 articles.
1. Metastable phase formation in titanium‐silicon thin films
2. Grazing Incidence X-Ray Diffraction Study on Effect of Implanted $\bf BF^{+}_{2}$ and Linewidth on Titanium Silicidation
3. Study of C49‐TiSi2and C54‐TiSi2formation on doped polycrystalline silicon usingin situresistance measurements during annealing
4. Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/
5. Self-aligned Ti and Co silicides for high performance sub-0.18 μm CMOS technologies
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